Pre-polysilicon coating of glass substrate
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Summary Application Number: 01815870.6 Application date: 2001.08.27 name: Pre-polysilicon coating of glass substrate Public (announcement) number: CN1469848 Public (announcement) day: 2004.01.21 Main classification number: C03C17/22 The original application number of the division: Classification number: C03C17/22; C03C17/34 Award day: priority: 2000.8.28 US 09/649,724 Application (patent) person: Applied Materials Ltd. address: California Invention (design) person: K·S·Lab; D·Medan International application: PCT/US01/26668 2001.8.27 International announcement: WO02/019363 English 2002.3.7 Enter country date: 2003.03.18 Patent agency: China Council for the Promotion of International Trade Patent and Trademark Office agent: Cai Shengyou
A method and apparatus for forming a polysilicon layer on a pre-annealed glass substrate. In one embodiment, the method comprises: loading a pre-annealed glass substrate in a deposition chamber, depositing an amorphous silicon layer on the pre-annealed glass substrate, and annealing the pre-annealed glass substrate to form a polysilicon layer thereon . The amorphous silicon layer may be deposited while the annealing step is being performed to form a polysilicon layer on the pre-annealed glass substrate. The nitride layer and/or the oxide layer may be deposited prior to depositing the amorphous silicon layer, and the pre-annealed glass substrate is annealed.